RAPID WRITING OF FINE LINES IN LANGMUIR-BLODGETT FILMS USING ELECTRON-BEAMS

被引：48

作者：

BROERS, AN ^{[1
]}

POMERANTZ, M ^{[1
]}

机构：

[1] IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598

来源：

关键词：

D O I：

10.1016/0040-6090(83)90399-1

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：323 / 329

页数：7

共 15 条

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[2] Broers A. N., 1980, Microcircuit engineering, P1
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[4] BROERS AN, 1976, APPL PHYS LETT, V15, P98
[5] BROERS AN, 1978, 9TH P INT C EL MICR, V3, P343
[6] PHASE-SLIP AND LOCALIZATION DIFFUSION LENGTHS IN AMORPHOUS W-RE ALLOYS
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SPILLER, E
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[J]. PHYSICAL REVIEW LETTERS, 1980, 45 (11) : 930 - 932
[7] ALIGNMENT OF LIQUID-CRYSTALS USING SUBMICROMETER PERIODICITY GRATINGS
FLANDERS, DC
SHAVER, DC
SMITH, HI
[J]. APPLIED PHYSICS LETTERS, 1978, 32 (10) : 597 - 598
[8] CRYSTALLOGRAPHIC ORIENTATION OF SILICON ON AN AMORPHOUS SUBSTRATE USING AN ARTIFICIAL SURFACE-RELIEF GRATING AND LASER CRYSTALLIZATION
GEIS, MW
FLANDERS, DC
SMITH, HI
[J]. APPLIED PHYSICS LETTERS, 1979, 35 (01) : 71 - 74
[9] EXPERIMENTAL-STUDY OF ANDERSON LOCALIZATION IN THIN WIRES
GIORDANO, N
GILSON, W
PROBER, DE
[J]. PHYSICAL REVIEW LETTERS, 1979, 43 (10) : 725 - 728
[10] KONIG H, 1948, NATURWISSENSCHAFTEN, V35, P261