CHARACTERIZATION OF CHROMIUM NITRIDE AND CARBONITRIDE COATINGS DEPOSITED AT LOW-TEMPERATURE BY ORGANOMETALLIC CHEMICAL VAPOR-DEPOSITION

被引：49

作者：

SCHUSTER, F

MAURY, F

NOWAK, JF

BERNARD, C

机构：

[1] ECOLE NATL SUPER CHIM TOULOUSE,CNRS,URA 445,118 ROUTE NARBONNE,F-31077 TOULOUSE,FRANCE

[2] UNIREC,CTR RECH UNIEUX,F-42702 FIRMINY,FRANCE

[3] ECOLE NATL SUPER ELECTROCHIM & ELECTROMET GRENOBLE,THERMODYNAM & PHYS CHIM MAT LAB,F-38402 ST MARTIN DHERES,FRANCE

来源：

SURFACE & COATINGS TECHNOLOGY | 1991年 / 46卷 / 03期

关键词：

D O I：

10.1016/0257-8972(91)90170-2

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

Chromium nitride and carbonitride hard coatings were deposited by organometallic chemical vapour deposition in the temperature range 350-550-degrees-C. Bis(benzene)chromium and NH3 or N2H4 were used as chromium and nitrogen vapour sources respectively. The chemical and structural characterization of these coatings is presented. Amorphous films were obtained below 450-degrees-C. Above this temperature, a different phase, namely Cr7C3, Cr2 (N,C) or CrN could be prepared depending on the gas phase composition. Electron probe microanalysis and X-ray photoelectron spectroscopy gave evidence for a slight contamination of the films with free carbon. The experimental results are in good agreement with a thermodynamic calculation which has been fruitful in giving information about the feasibility of growing chromium nitride phases under these chemical vapour deposition conditions. The microhardness of the coating in each case was comparable with that of similar material deposited by other techniques.

引用

页码：275 / 288

页数：14

共 21 条

[1] HEAT CAPACITY AND VAPOR PRESSURE OF CRYSTALLINE BIS(BENZENE)CHROMIUM . THIRD-LAW ENTROPY COMPARISON AND THERMODYNAMIC EVIDENCE CONCERNING STRUCTURE OF BIS(BENZENE)CHROMIUM [J].