HARDNESS AND GRAIN-SIZE RELATIONS FOR THICK CHROMIUM FILMS DEPOSITED BY HOLLOW-CATHODE DISCHARGE

被引：26

作者：

KOMIYA, S ^{[1
]}

ONO, S ^{[1
]}

UMEZU, N ^{[1
]}

机构：

[1] ULVAC CORP,CHIGASAKI 253,JAPAN

来源：

关键词：

D O I：

10.1016/0040-6090(77)90234-6

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：473 / 479

页数：7

共 16 条

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[5] KOMIYA S, 1974, JPN J APPL PHYS, P415
[6] PHYSICAL VAPOR-DEPOSITION OF THICK CR AND ITS CARBIDE AND NITRIDE FILMS BY HOLLOW-CATHODE DISCHARGE
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