PARTIAL DISINTEGRATION AND CHANGE OF CONCENTRATION PROFILES AT ION BOMBARDED NA SILICATE GLASS SURFACES

被引：13

作者：

BACH, H ^{[1
]}

机构：

[1] JENAER GLASWERK SCHOTT & GEN,LAB FIRMA,6500 MAINZ,WEST GERMANY

来源：

RADIATION EFFECTS AND DEFECTS IN SOLIDS | 1974年 / 22卷 / 02期

关键词：

Compendex;

D O I：

10.1080/00337577408232150

中图分类号：

TL [原子能技术]; O571 [原子核物理学];

学科分类号：

0827 ; 082701 ;

摘要：

PHOTONS

引用

页码：73 / 78

页数：6

共 21 条

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BACH, H
[J]. ZEITSCHRIFT FUR NATURFORSCHUNG PART A-ASTROPHYSIK PHYSIK UND PHYSIKALISCHE CHEMIE, 1972, A 27 (02): : 333 - &
[3] MEASUREMENT OF ION CONCENTRATION PROFILES IN SURFACE LAYERS OF LEACHED (SWOLLEN) GLASS ELECTRODE MEMBRANES BY MEANS OF LUMINESCENCE EXCITED BY ION SPUTTERING
BACH, H
BAUCKE, FGK
[J]. ELECTROCHIMICA ACTA, 1971, 16 (08) : 1311 - &
[4] DETERMINATION OF BOND ENERGY OF SILICA GLASS BY MEANS OF ION SPUTTERING INVESTIGATIONS
BACH, H
[J]. NUCLEAR INSTRUMENTS & METHODS, 1970, 84 (01): : 4 - &
[5] BACH H, 1970, Z ANGEW PHYSIK, V28, P239
[6] BACH H, 1969, THESIS MAINZ
[7] BACH H, 1971, 9TH INT C GLASS VERS, V1, P155
[8] BACH H, 1948, VERHANDL DPG, V22, P41
[9] BACH H, 1972, BEITR ELEKTRONENMIKR, V5, P479
[10] BACH H, 1972, INT J MASS SPECTROM, V9, P247