APPLICATIONS OF DEPTH PROFILING BY AUGER-SPUTTER TECHNIQUES

被引：34

作者：

HOLLOWAY, DM ^{[1
]}

机构：

[1] GE,NEUTRON DEVICES DEPT,POB 11508,ST PETERSBURG,FL 33733

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1975年 / 12卷 / 01期

关键词：

D O I：

10.1116/1.568799

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：392 / 399

页数：8

共 70 条

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