THE EXTRION-1000 - A NEW HIGH-CURRENT ION-IMPLANTATION SYSTEM FOR AUTOMATED FABRICATION ENVIRONMENTS AND INTELLIGENT PROCESS-CONTROL

被引：5

作者：

LIEBERT, RB

DELFORGE, A

HERTEL, R

LULSDORF, H

MEARS, E

SATOH, S

机构：

来源：

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS | 1989年 / 37-8卷

关键词：

D O I：

10.1016/0168-583X(89)90240-1

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

引用

页码：533 / 537

页数：5

共 6 条

[1]

BRAINARD JP, 1983, REV SCI INSTRUM, V54, P1493

[2]

DELFORGE A, 1988, 7TH INT C ION IMPL T

[3] APPLICATIONS OF MAGNETIC SCANNING TO HIGH-CURRENT IMPLANTATION [J].

HANLEY, PR ;

EHRLICH, CD .

IEEE TRANSACTIONS ON NUCLEAR SCIENCE, 1981, 28 (02) :1747-1750

[4] A VACUUM EXCHANGE END STATION FOR A NEW BATCH PROCESS ION-IMPLANTATION SYSTEM [J].

HERTEL, R ;

FREYTSIS, A ;

MEARS, E ;

DELFORGE, A .

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 1989, 37-8 :580-583

[5] DOSE CONTROL-SYSTEM FOR THE EXTRION-1000 ION-IMPLANTATION SYSTEM [J].

LIEBERT, RB ;

SATOH, S ;

DELFORGE, A ;

EVANS, E .

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 1989, 37-8 :464-468

[6] ION-BEAM SYSTEM FOR THE NEW HIGH-CURRENT ION-IMPLANTATION SYSTEM EXTRION-1000 [J].

SATOH, S ;

SAKASE, T ;

EVANS, E ;

LIEBERT, RB .

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 1989, 37-8 :612-615

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