GAS-PHASE-FUNCTIONALIZED PLASMA-DEVELOPED RESISTS - INITIAL CONCEPTS AND RESULTS FOR ELECTRON-BEAM EXPOSURE

被引：60

作者：

TAYLOR, GN

STILLWAGON, LE

VENKATESAN, T

机构：

来源：

关键词：

D O I：

10.1149/1.2115932

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：1658 / 1664

页数：7

共 13 条

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[2] FOLLETT D, 1982, ELECTROCHEMICAL SOC, V82, P321
[3] GREENEICH GS, 1981, J VAC SCI TECHNOL, V19, P1269
[4] LYNCH WG, COMMUNICATION
[5] MILLER SM, 1963, J POLYM SCI POL CHEM, P2537
[6] PEASE RFW, 1982, MAY EL SOC M MONTR
[7] ROBERTS RL, UNPUB
[8] SALOVEY R, 1973, RAD CHEM MACROMOLECU
[9] ORGANO-SILICON MONOMERS FOR PLASMA-DEVELOPED X-RAY RESISTS
TAYLOR, GN
WOLF, TM
MORAN, JM
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1981, 19 (04): : 872 - 880
[10] TAYLOR GN, 1981, SEP P MICR ENG 81, P381