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- [2] BORON-NITRIDE MASK STRUCTURE FOR X-RAY-LITHOGRAPHY[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1979, 16 (06): : 1959 - 1961MAYDAN, DCOQUIN, GALEVINSTEIN, HJSINHA, AKWANG, DNK
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- [5] MIXTURES OF POLY (2,3-DICHLORO-1-PROPYL ACRYLATE) AND POLY (GLYCIDYL METHACRYLATE-CO-ETHYL ACRYLATE) AS AN X-RAY RESIST WITH IMPROVED ADHESION[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1979, 16 (06): : 2014 - 2019MORAN, JMTAYLOR, GN
- [6] SENSITIVE CHLORINE-CONTAINING RESISTS FOR X-RAY LITHOGRAPHY[J]. POLYMER ENGINEERING AND SCIENCE, 1977, 17 (06) : 420 - 429TAYLOR, GNCOQUIN, GASOMEKH, S
- [7] PLASMA-DEVELOPED X-RAY RESISTS[J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1980, 127 (12) : 2665 - 2674TAYLOR, GNWOLF, TM
- [8] OXYGEN PLASMA REMOVAL OF THIN POLYMER-FILMS[J]. POLYMER ENGINEERING AND SCIENCE, 1980, 20 (16) : 1087 - 1092TAYLOR, GNWOLF, TM
- [9] TAYLOR GS, UNPUBLISHED
- [10] WOLF TM, UNPUBLISHED