PLASMA-DEVELOPED X-RAY RESISTS

[1] REDUCTION OF PHOTORESIST STRIPPING RATES IN AN OXYGEN PLASMA BY BY-PRODUCT INHIBITION AND THERMAL MASS [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1977, 124 (01) : 147 - 152

[2] BERSIN RL, 1970, SOLID STATE TECHNOL, V13, P39

[3] BROERS AN, 1964, 1ST P INT C EL ION B, P191

[4] PHOTOLOCKING - NEW TECHNIQUE FOR FABRICATING OPTICAL-WAVEGUIDE CIRCUITS [J]. APPLIED PHYSICS LETTERS, 1974, 24 (02) : 72 - 74

[5] CHANDROSS EA, 1975, APPL PHYS LETT, V25, P303

[6] SOL-GEL BEHAVIOR AND IMAGE-FORMATION IN POLY(GLYCIDYL METHACRYLATE) AND ITS COPOLYMERS WITH ETHYL ACRYLATE [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1978, 15 (03): : 944 - 947

[7] FEIT ED, UNPUBLISHED

[8] ELECTRON RESISTS FOR MICROCIRCUIT AND MASK PRODUCTION [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1969, 116 (07) : 1033 - &

[9] 3 DIMENSIONAL BEHAVIOR OF NEGATIVE ELECTRON RESISTS [J]. POLYMER ENGINEERING AND SCIENCE, 1977, 17 (06) : 377 - 380

[10] HOFER DC, 1979, OCT P REG TECH C ELL, P245

[1] REDUCTION OF PHOTORESIST STRIPPING RATES IN AN OXYGEN PLASMA BY BY-PRODUCT INHIBITION AND THERMAL MASS [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1977, 124 (01) : 147 - 152

[2] BERSIN RL, 1970, SOLID STATE TECHNOL, V13, P39

[3] BROERS AN, 1964, 1ST P INT C EL ION B, P191

[4] PHOTOLOCKING - NEW TECHNIQUE FOR FABRICATING OPTICAL-WAVEGUIDE CIRCUITS [J]. APPLIED PHYSICS LETTERS, 1974, 24 (02) : 72 - 74

[5] CHANDROSS EA, 1975, APPL PHYS LETT, V25, P303

[6] SOL-GEL BEHAVIOR AND IMAGE-FORMATION IN POLY(GLYCIDYL METHACRYLATE) AND ITS COPOLYMERS WITH ETHYL ACRYLATE [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1978, 15 (03): : 944 - 947

[7] FEIT ED, UNPUBLISHED

[8] ELECTRON RESISTS FOR MICROCIRCUIT AND MASK PRODUCTION [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1969, 116 (07) : 1033 - &

[9] 3 DIMENSIONAL BEHAVIOR OF NEGATIVE ELECTRON RESISTS [J]. POLYMER ENGINEERING AND SCIENCE, 1977, 17 (06) : 377 - 380

[10] HOFER DC, 1979, OCT P REG TECH C ELL, P245