SOL-GEL BEHAVIOR AND IMAGE-FORMATION IN POLY(GLYCIDYL METHACRYLATE) AND ITS COPOLYMERS WITH ETHYL ACRYLATE

被引:38
作者
FEIT, ED
WURTZ, ME
KAMMLOTT, GW
机构
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1978年 / 15卷 / 03期
关键词
D O I
10.1116/1.569681
中图分类号
O59 [应用物理学];
学科分类号
摘要
For the formation of rather large features ( greater than 5 mu m on a side) in poly(glycidyl methacrylate) and its copolymers with ethyl acrylate, the lithographic response can be characterized by a gel-point energy and a contrast. The gel-point occurs at 6. 8 eV absorbed energy per molecule of homopolymer or of its effective equivalent in the copolymer. The contrasts of these negative resists are dynamic properties, but depend in part on the polymer's dispersitivity, at least to a value 2. 3. As features are progressively reduced, the gel-point advances to higher dose and the contrast increases. These new parameters correlate poorly with the molecular parameters of the polymers; they depend instead on developer-induced swelling of the image, on competitive wetting of the support layer by the developer and the polymer and on gel-rupture by forced development.
引用
收藏
页码:944 / 947
页数:4
相关论文
共 19 条
[1]   GEL FORMATION IN NEGATIVE ELECTRON RESISTS [J].
ATODA, N ;
KAWAKATSU, H .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1976, 123 (10) :1519-1524
[2]   PROXIMITY EFFECT IN ELECTRON-BEAM LITHOGRAPHY [J].
CHANG, THP .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1975, 12 (06) :1271-1275
[3]  
CHAPIRO A, 1962, RADIATION CHEMISTRY, pCH8
[4]  
CHARLESBY A, 1967, ADV CHEM SERIES, V23, P1
[5]  
CHARLESBY A, 1960, ATOMIC RAD POLYM, pCH9
[6]  
FEIT ED, 1974, APPL POLYM S, V23, P125
[7]  
FLORY PJ, 1953, PRINCIPLES POLYM CHE, pCH13
[8]   MODEL FOR EXPOSURE OF ELECTRON-SENSITIVE RESISTS [J].
GREENEICH, JS ;
VANDUZER, T .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1973, 10 (06) :1056-1059
[9]   RECENT DEVELOPMENTS IN ELECTRON-RESIST EVALUATION TECHNIQUES [J].
HATZAKIS, M .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1975, 12 (06) :1276-1279
[10]   ENERGY DISSIPATION IN A THIN POLYMER FILM BY ELECTRON-BEAM SCATTERING [J].
HAWRYLUK, RJ ;
HAWRYLUK, AM ;
SMITH, HI .
JOURNAL OF APPLIED PHYSICS, 1974, 45 (06) :2551-2566