INSITU NOBLE-METAL YBA2CU3O7 THIN-FILM CONTACTS

被引:48
作者
EKIN, JW
RUSSEK, SE
CLICKNER, CC
JEANNERET, B
机构
[1] Electromagnetic Technology Division, National Institute of Standards and Technology, Boulder
关键词
D O I
10.1063/1.108959
中图分类号
O59 [应用物理学];
学科分类号
摘要
Thin-film contacts to YBa2Cu3O7 have been fabricated by an in situ noble-metal process and patterned down to 2 X 2 mum2; at this small size, the contacts carry transport current over 10(6) A/cm2 while maintaining a specific contact resistivity rho(c) in the 10(-8) to 10(-9) OMEGA CM2 range. No oxygen annealing was used in the processing, thus avoiding the problem of silver or gold agglomeration, as well as preserving a sharp interface for Josephson-device applications. rho(c) was measured to increase only approximately 25% as temperature was increased from 4 to 90 K. The measurements were carried out on a series of film morphologies using both superconductor-normal metal and superconductor-normal metal-superconductor test structures; a carefully designed test pattern was used to correct for spreading conduction in the noble-metal contact layer. The contacts were ohmic with voltage-current characteristics that were linear over more than four orders of magnitude.
引用
收藏
页码:369 / 371
页数:3
相关论文
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