OPTIMIZATION OF PLASMA PROCESSING FOR SILICON-GATE FET MANUFACTURING APPLICATIONS

被引：9

作者：

BERGENDAHL, AS

BERGERON, SF

HARMON, DL

机构：

来源：

IBM JOURNAL OF RESEARCH AND DEVELOPMENT | 1982年 / 26卷 / 05期

关键词：

D O I：

10.1147/rd.265.0580

中图分类号：

TP3 [计算技术、计算机技术];

学科分类号：

0812 ;

摘要：

引用

页码：580 / 589

页数：10

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