ASYMPTOTIC ESTIMATES OF DIFFUSION TIMES FOR RAPID THERMAL ANNEALING

被引：12

作者：

FEHRIBACH, JD

GHEZ, R

OEHRLEIN, GS

机构：

来源：

APPLIED PHYSICS LETTERS | 1985年 / 46卷 / 04期

关键词：

D O I：

10.1063/1.95603

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：433 / 435

页数：3

共 8 条

[1]

BENDER CM, 1978, ADV MATH METHODS SCI, P261

[2]

Braunlich P., 1979, THERMALLY STIMULATED

[3] EXACT DESCRIPTION AND DATA FITTING OF ION-IMPLANTED DOPANT PROFILE EVOLUTION DURING ANNEALING [J].

GHEZ, R ;

OEHRLEIN, GS ;

SEDGWICK, TO ;

MOREHEAD, FF ;

LEE, YH .

APPLIED PHYSICS LETTERS, 1984, 45 (08) :881-883

[4]

HAM JL, 1943, T AM SOC MET, V31, P877

[5]

OEHRLEIN GS, 1984, 13TH P INT C DEF SEM

[6]

Redhead P. A., 1962, VACUUM, V12, P203

[7]

ROTHMAN SJ, 1984, DIFFUSION CRYSTALLIN, P1

[8]

Sedgwick T. O., 1984, VLSI Science and Technology-1984. Proceedings of the Second International Symposium on Very Large Scale Integration Science and Technology. Materials for High Speed/High Density Applications, P192

← 1 →