STRUCTURAL ORIGIN OF THE 5.16-EV OPTICAL-ABSORPTION BAND IN SILICA AND GE-DOPED SILICA

被引:35
作者
TSAI, TE
FRIEBELE, EJ
RAJARAM, M
MUKHAPADHYAY, S
机构
[1] GE CO,DIV QUARTZ PROD,RICHMOND HTS,OH 44143
[2] VIRGINIA POLYTECH INST & STATE UNIV,BLACKSBURG,VA 24061
关键词
D O I
10.1063/1.111891
中图分类号
O59 [应用物理学];
学科分类号
摘要
The origin of the 5.16 eV absorption band observed in silica and Ge-doped silica was studied using optical and electron spin resonance (ESR) measurements. The band was observed only in samples containing Ge, suggesting that it is related to the Ge impurity in silica, while a lack of correlation between the ESR intensity of the induced hydrogen-associated doublet and the absorption coefficient of the 5.16 eV band indicates that it is not related to two-coordinated Si or Ge. The observation of the absorption coefficient increased as the square root of the Ge concentration demonstrates that the 5.16 eV band is not related to two-coordinated Ge defects but that it is an oxygen deficiency center of the divacancy type associated with Ge.
引用
收藏
页码:1481 / 1483
页数:3
相关论文
共 20 条
[1]   2-PHOTON PROCESSES IN DEFECT FORMATION BY EXCIMER LASERS IN SYNTHETIC SILICA GLASS [J].
ARAI, K ;
IMAI, H ;
HOSONO, H ;
ABE, Y ;
IMAGAWA, H .
APPLIED PHYSICS LETTERS, 1988, 53 (20) :1891-1893
[2]   ION-IMPLANTATION EFFECTS IN NONCRYSTALLINE SIO2 [J].
ARNOLD, GW .
IEEE TRANSACTIONS ON NUCLEAR SCIENCE, 1973, NS20 (06) :220-223
[3]   OPTICAL-PROPERTIES OF OXYGEN-DEFICIENT CENTERS IN SILICA GLASSES FABRICATED IN H2 OR VACUUM AMBIENT [J].
AWAZU, K ;
KAWAZOE, H ;
MUTA, K .
JOURNAL OF APPLIED PHYSICS, 1991, 70 (01) :69-74
[4]   SEMIEMPIRICAL CALCULATIONS OF POINT-DEFECTS IN SILICA - OXYGEN VACANCY AND TWOFOLD COORDINATED SILICON ATOM [J].
DIANOV, EM ;
SOKOLOV, VO ;
SULIMOV, VB .
JOURNAL OF NON-CRYSTALLINE SOLIDS, 1992, 149 (1-2) :5-18
[5]   NATURE AND ORIGIN OF THE 5-EV BAND IN SIO2-GEO2 GLASSES [J].
HOSONO, H ;
ABE, Y ;
KINSER, DL ;
WEEKS, RA ;
MUTA, K ;
KAWAZOE, H .
PHYSICAL REVIEW B, 1992, 46 (18) :11445-11451
[6]   2 TYPES OF OXYGEN-DEFICIENT CENTERS IN SYNTHETIC SILICA GLASS [J].
IMAI, H ;
ARAI, K ;
IMAGAWA, H ;
HOSONO, H ;
ABE, Y .
PHYSICAL REVIEW B, 1988, 38 (17) :12772-12775
[7]  
KINSER DL, 1993, 95TH ANN M AM CER SO, P281
[8]   PHOTOLUMINESCENCE CENTERS IN VAD SIO2 GLASSES SINTERED UNDER REDUCING OR OXIDIZING ATMOSPHERES [J].
KOHKETSU, M ;
AWAZU, K ;
KAWAZOE, H ;
YAMANE, M .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1989, 28 (04) :615-621
[9]  
NAGSAWA K, 1988, JPN J PAPL PHYS, V27, pL240
[10]   THEORY OF DEFECTS IN VITREOUS SILICON DIOXIDE [J].
OREILLY, EP ;
ROBERTSON, J .
PHYSICAL REVIEW B, 1983, 27 (06) :3780-3795