HYDROGENATION FOR POLYSILICON MOSFETS BY ION SHOWER DOPING TECHNIQUE

被引:6
作者
SETSUNE, K
MIYAUCHI, M
HIRAO, T
机构
关键词
D O I
10.1109/EDL.1986.26494
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
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页码:618 / 620
页数:3
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POLLACK GP, 1984, IEEE ELECTRON DEVICE, V5, P500
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