CVD GROWTH AND PROPERTIES OF PHOSLON DIELECTRIC FILMS

被引:5
作者
LI, PC
HSIA, LC
机构
关键词
D O I
10.1149/1.2108581
中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
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页码:366 / 372
页数:7
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