ELLIPSOMETRY MEASUREMENTS OF NICKEL SILICIDES

被引：19

作者：

CHEN, HW ^{[1
]}

LUE, JT ^{[1
]}

机构：

[1] NATL TSING HUA UNIV,DEPT ELECT ENGN,HSINCHU 300,TAIWAN

来源：

关键词：

D O I：

10.1063/1.337025

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：2165 / 2167

页数：3

共 10 条

[1]

Azzam RMA, 1977, ELLIPSOMETRY POLARIZ

[2]

CHAO S, 1981, THESIS U TEXAS AUSTI

[3]

ELABD H, 1982, RCA REV, V43, P568

[4]

HOVEL HJ, 1975, SEMICONDUCTORS SEMIM, V11, pCH6

[5] INFRARED-ABSORPTION OF THIN METAL-FILMS - PT ON SI [J].

MAHAN, GD ;

MARPLE, DTF .

[6] INFRARED OPTICAL-CONSTANTS OF PTSI [J].

PIMBLEY, JM ;

KATZ, W .

[7] SEQUENCE OF PHASE FORMATION IN PLANAR METAL-SI REACTION COUPLES [J].

TSAUR, BY ;

LAU, SS ;

MAYER, JW ;

NICOLET, MA .

[8]

Tu K. N., 1978, Thin films. Interdiffusion and reactions, P359

[9]

WEAST RC, 1974, HDB CHEM PHYSICS, pE228

[10]

ZIMAN JM, 1964, PRINCIPLES THEORY SO, P239