Ionizing radiation tolerance of high-performance SiGe HBT's grown by UHV/CVD

被引:53
作者
Babcock, JA
Cressler, JD
Vempati, LS
Clark, SD
Jaeger, RC
Harame, DL
机构
[1] USN,CTR SURFACE WARFARE,CRANE,IN 47522
[2] IBM CORP,DIV MICROELECTR,HOPEWELL JCT,NY 12533
关键词
D O I
10.1109/23.488750
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The ionizing radiation tolerance of highperformance SiGe HBT's, grown by UHV/CVD and optimized for 77 K, has been investigated for the first time. Results at both 300 K and 77 K indicate that this SiGe technology is inherently radiation tolerant without additional processing steps. Perimeter-to-area analysis show parallel shifts in the collector and base current density for total radiation doses below 1.0 Mrad(Si). Relatively minor degradation in the current gain characteristics is observed for SiGe HBT's exposed to 1.0 Mrad(Si) of Co-60 gamma radiation, indicating that the technology is robust for many applications requiring a high degree of ionizing radiation tolerance. 1/f noise measurements made pre- and post-radiation show the appearance of a generation-recombination center in some of the SiGe HBT's after a total-dose exposure to 10.0 Mrad(Si).
引用
收藏
页码:1558 / 1566
页数:9
相关论文
共 42 条
[1]   IONIZING-RADIATION TOLERANCE AND LOW-FREQUENCY NOISE DEGRADATION IN UHV/CVD SIGE HBTS [J].
BABCOCK, JA ;
CRESSLER, JD ;
VEMPATI, LS ;
CLARK, SD ;
JAEGER, RC ;
HARAME, DL .
IEEE ELECTRON DEVICE LETTERS, 1995, 16 (08) :351-353
[2]  
BABCOCK JA, 1995, MAY P LOW TEMP EL HI, V959, P221
[3]  
BABCOCK JA, UNPUB 1996 INT PHYS
[4]  
BABCOCK JA, 1995, IN PRESS IEDM
[5]   HIGH-LOW POLYSILICON-EMITTER SIGE-BASE BIPOLAR-TRANSISTORS [J].
CRABBE, EF ;
COMFORT, JH ;
CRESSLER, JD ;
SUN, JYC ;
STORK, JMC .
IEEE ELECTRON DEVICE LETTERS, 1993, 14 (10) :478-480
[6]   AN EPITAXIAL EMITTER-CAP SIGE-BASE BIPOLAR TECHNOLOGY OPTIMIZED FOR LIQUID-NITROGEN TEMPERATURE OPERATION [J].
CRESSLER, JD ;
CRABBE, EF ;
COMFORT, JH ;
SUN, JYC ;
STORK, JMC .
IEEE ELECTRON DEVICE LETTERS, 1994, 15 (11) :472-474
[7]   ON THE PROFILE DESIGN AND OPTIMIZATION OF EPITAXIAL SI-BASE AND SIGE-BASE BIPOLAR TECHNOLOGY FOR 77-K APPLICATIONS .1. TRANSISTOR DC DESIGN CONSIDERATIONS [J].
CRESSLER, JD ;
COMFORT, JH ;
CRABBE, EF ;
PATTON, GL ;
STORK, JMC ;
SUN, JYC ;
MEYERSON, BS .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 1993, 40 (03) :525-541
[8]   ON THE PROFILE DESIGN AND OPTIMIZATION OF EPITAXIAL SI-BASE AND SIGE-BASE BIPOLAR TECHNOLOGY FOR 77-K APPLICATIONS .2. CIRCUIT PERFORMANCE ISSUES [J].
CRESSLER, JD ;
CRABBE, EF ;
COMFORT, JH ;
STORK, JMC ;
SUN, JYC .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 1993, 40 (03) :542-556
[9]  
CRESSLER JD, 1994, IEEE INT SOLID STATE, P24
[10]  
DAWE G, 1994, APPL MICROWAVE W SUM, P14