MOLECULAR-BEAM EPITAXY FROM RESEARCH TO MANUFACTURING

被引：19

作者：

CHO, AY

机构：

[1] Semiconductor Research, AT&T Bell Laboratories, Room 6H-422, Murray Hill, NJ, 07974-0636

来源：

MRS BULLETIN | 1995年 / 20卷 / 04期

关键词：

D O I：

10.1557/S0883769400044638

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

The following is an edited transcript of the address that Von Hippel Award recipient A.Y. Cho gave at the 1994 MRS Fall Meeting. Cho received the Materials Research Society‘s highest honor “for pioneering work in the development of molecular beam epitaxy (MBE), and its application to devices based on quantum wells and artificially structured materials.”. © 1995, Materials Research Society. All rights reserved.

引用

页码：21 / 28

页数：8

共 4 条

[1] GROWTH OF PERIODIC STRUCTURES BY MOLECULAR-BEAM METHOD [J].