COMPLETE WETTING OF A ROUGH-SURFACE - AN X-RAY STUDY

被引：143

作者：

TIDSWELL, IM ^{[1
]}

RABEDEAU, TA ^{[1
]}

PERSHAN, PS ^{[1
]}

KOSOWSKY, SD ^{[1
]}

机构：

[1] HARVARD UNIV,DIV APPL SCI,CAMBRIDGE,MA 02138

来源：

PHYSICAL REVIEW LETTERS | 1991年 / 66卷 / 16期

关键词：

D O I：

10.1103/PhysRevLett.66.2108

中图分类号：

O4 [物理学];

学科分类号：

0702 ;

摘要：

The evolution of the surface structure of a wetting film on a rough surface as a function of the film thickness has been studied by x-ray specular reflection and surface diffuse scattering. For thin films (less-than-or-similar-to 60 angstrom) the liquid surface is characterized by static undulations induced by the roughness of the substrate; however, with increasing film thickness the structure is dominated by thermally induced capillary waves. The data are quantitatively described by a model with exclusively van der Waals liquid-substrate interactions.

引用

页码：2108 / 2111

页数：4

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