FEATURE SIZE AND TEMPERATURE SENSITIVE PROCESS WINDOWS FOR EXCIMER LASER PLANARIZATION OF ALUMINUM

被引:12
作者
BASEMAN, RJ
机构
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1990年 / 8卷 / 01期
关键词
D O I
10.1116/1.584833
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
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页码:84 / 90
页数:7
相关论文
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