POLYMER PHOTOABLATION UNDER WINDOWLESS VUV HYDROGEN OR HELIUM DISCHARGE LAMP

被引：12

作者：

FUCHS, C

GOETZBERGER, O

HENCK, R

FOGARASSY, E

机构：

[1] Laboratoire PHASE (UPR 292), CNRS, Strasbourg Cedex 2, F-67037

来源：

APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING | 1995年 / 60卷 / 05期

关键词：

D O I：

10.1007/BF01538776

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

In this work, the photoablation of PolyPhenylQuinoxaline (PPQ) films is investigated by using the vacuum ultraviolet (VUV) incoherent emission (lambda < 160 nm) from a novel windowless hydrogen (or helium) discharge lamp. A tentative explanation of the film etching process is given through the photochemical reactions which take place in the polymer under VUV illumination.

引用

页码：505 / 507

页数：3

共 10 条

[1] ABLATION OF THIN POLYMER-FILMS ON SI OR METAL-SUBSTRATE WITH THE LOW INTENSITY UV BEAM OF AN EXCIMER LASER OR MERCURY LAMP - ADVANTAGES OF ELLIPSOMETRIC RATE MEASUREMENTS [J].