STRUCTURE OF SELECTIVE LOW-PRESSURE CHEMICALLY VAPOR-DEPOSITED FILMS OF TUNGSTEN

被引：92

作者：

GREEN, ML

LEVY, RA

机构：

来源：

关键词：

D O I：

10.1149/1.2114081

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：1243 / 1250

页数：8

共 17 条

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FISK, M
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[J]. THIN SOLID FILMS, 1983, 107 (01) : 39 - 43
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[10] HOFFMAN RW, 1974, PHYSICS NONMETALLIC, P273