IMAGES OF A MICROELECTRONIC DEVICE WITH THE X1-SPEM, A 1ST GENERATION SCANNING PHOTOEMISSION MICROSCOPE AT THE NATIONAL SYNCHROTRON LIGHT-SOURCE

被引:21
作者
ADE, H
KIRZ, J
HULBERT, S
JOHNSON, E
ANDERSON, E
KERN, D
机构
[1] BROOKHAVEN NATL LAB,NSLS,UPTON,NY 11973
[2] CTR XRAY OPT,LBL,BERKELEY,CA 94720
[3] IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1991年 / 9卷 / 03期
关键词
D O I
10.1116/1.577541
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
We have recently completed the first generation scanning photoemission microscope at beamline X1A at the National Synchrotron Light Source (NSLS), the X1-SPEM. The instrument is designed to use the soft x-ray undulator at the NSLS as a high brightness source to illuminate a Fresnel zone plate, thus forming a finely focused probe, less-than-or-equal-to 0.4-mu-m in size, on the specimen surface. A grating monochromator selects the photon energy in the 400-800 eV range with an energy resolution of 0.8-2 eV. The flux in the zone plate focus is in the 10(8)-10(9) photons/s range. A single pass cylindrical mirror analyzer (CMA) is used to record photoemission spectra, or to form an image within a fixed electron energy bandwidth as the specimen is mechanically scanned. The best one-dimensional resolution achieved so far is 0.1-mu-m, as judged by the 25%-75% intensity rise across an edge. This is close to the diffraction limit of the zone plate used. Due to astigmatism introduced by the beamline optics, the two-dimensional resolution in the plane of least confusion is presently limited to 0.4-mu-m. Images of a microelectronic device are presented, along with some representative spectra, to demonstrate the present capabilities. With an upgrade of the beamline optics, and a new generation of zone plates, the two-dimensional spatial resolution in a second generation instrument is anticipated to be about 50 nm.
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页码:1902 / 1906
页数:5
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