IMPROVEMENT OF KELVIN PROBE FORCE MICROSCOPE (KFM) SYSTEM

被引:21
作者
YASUTAKE, M
机构
[1] Seiko Instruments and Electronics, Scientific Instruments Department, Shizuoka, 410-13, 36-1 Takenoshita Oyama-cho, Sunto-gun
来源
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 1995年 / 34卷 / 6B期
关键词
KELVIN PROBE FORCE MICROSCOPE; ATOMIC FORCE MICROSCOPE; SCANNING MAXWELL STRESS MICROSCOPE; SURFACE POTENTIAL; CAPACITANCE MEASUREMENT;
D O I
10.1143/JJAP.34.3403
中图分类号
O59 [应用物理学];
学科分类号
摘要
The Kelvin probe force microscope (KFM) is a useful tool that measures the surface potentials of both conducting and nonconducting materials. Recently, we have succeeded in improving the accuracy of potential measurements and increased the lateral resolution of the topographic image. Furthermore, Z axis servo control was improved to prevent the tip from coming into contact with the sample surface during scanning. Finally, the force gradient between the tip and the sample became steeper during the acquisition of the topographic image due to the inactivation of the modulation AC voltage. As a result, the potential resolution was less than 1 mV and the lateral resolution of the topographic image was improved to as high as 10 nm.
引用
收藏
页码:3403 / 3405
页数:3
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