ORGANOMETALLIC CHEMICAL VAPOR-DEPOSITION OF STRONTIUM-TITANATE

被引：53

作者：

FEIL, WA ^{[1
]}

WESSELS, BW ^{[1
]}

TONGE, LM ^{[1
]}

MARKS, TJ ^{[1
]}

机构：

[1] NORTHWESTERN UNIV,DEPT CHEM,EVANSTON,IL 60208

来源：

JOURNAL OF APPLIED PHYSICS | 1990年 / 67卷 / 08期

关键词：

D O I：

10.1063/1.345034

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

SrTiO3 thin films were deposited by low-pressure organometallic chemical vapor deposition. Titanium isopropoxide, Sr(dipivaloylmethanate) 2, oxygen, and water vapor were used as reactants, and argon was used as a carrier gas. Growth rates ranging from 0.3 to 4.5 μm/h were obtained on (0001) sapphire substrates at 600-850 °C. Highly textured SrTiO3 films with a [111] orientation were obtained at a growth temperature of 800 °C. The growth parameters which influenced the composition, phase stability, morphology, and texture of the thin films were examined.

引用

页码：3858 / 3861

页数：4

共 9 条

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