FORMATION OF THIN SILICON-OXIDE FILMS BY RAPID THERMAL HEATING

被引：22

作者：

PONPON, JP

GROB, JJ

GROB, A

STUCK, R

机构：

来源：

JOURNAL OF APPLIED PHYSICS | 1986年 / 59卷 / 11期

关键词：

D O I：

10.1063/1.337040

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

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页码：3921 / 3923

页数：3

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