CHARACTERISTICS OF SUB-MICRON PATTERNS FABRICATED BY GALLIUM FOCUSED-ION-BEAM SPUTTERING

被引：22

作者：

MORIMOTO, H

SASAKI, Y

WATAKABE, Y

KATO, T

机构：

来源：

JOURNAL OF APPLIED PHYSICS | 1985年 / 57卷 / 01期

关键词：

D O I：

10.1063/1.335387

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：159 / 160

页数：2

共 8 条

[1]

BAN E, 1982, 6TH P S ISIAT KYOT, P121

[2] MINIATURE ION SOURCES FOR ANALYTICAL INSTRUMENTS [J].

CLAMPITT, R ;

JEFFERIES, DK .

NUCLEAR INSTRUMENTS & METHODS, 1978, 149 (1-3) :739-742

[3]

DIMIGEN H, 1975, PHILIPS TECH REV, V35, P199

[4] HIGH-RESOLUTION SPUTTERING USING A FOCUSED ION-BEAM [J].

KUBENA, RL ;

SELIGER, RL ;

STEVENS, EH .

THIN SOLID FILMS, 1982, 92 (1-2) :165-169

[5] ION ETCHING FOR PATTERN DELINEATION [J].

MELLIARSMITH, CM .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1976, 13 (05) :1008-1022

[6]

MORIMOTO H, 1983, 1983 P INT ION ENG C, P777

[7] HIGH-RESOLUTION, ION-BEAM PROCESSES FOR MICROSTRUCTURE FABRICATION [J].

SELIGER, RL ;

KUBENA, RL ;

OLNEY, RD ;

WARD, JW ;

WANG, V .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1979, 16 (06) :1610-1612

[8] HIGH-INTENSITY SCANNING ION PROBE WITH SUBMICROMETER SPOT SIZE [J].

SELIGER, RL ;

WARD, JW ;

WANG, V ;

KUBENA, RL .

APPLIED PHYSICS LETTERS, 1979, 34 (05) :310-312

← 1 →