EFFECTS OF CHARGE NEUTRALIZATION ON ION-BEAM-DEPOSITED BORON-NITRIDE FILMS

被引：30

作者：

HALVERSON, W ^{[1
]}

QUINTO, DT ^{[1
]}

机构：

[1] KENNAMETAL INC,GREENSBURG,PA 15601

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1985年 / 3卷 / 06期

关键词：

D O I：

10.1116/1.573268

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

页码：2141 / 2146

页数：6

共 14 条

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