ELECTROCHROMISM IN TUNGSTEN OXYFLUORIDE FILMS MADE BY CHEMICALLY ENHANCED DC SPUTTERING

被引：16

作者：

AZENS, A ^{[1
]}

STJERNA, B ^{[1
]}

GRANQVIST, CG ^{[1
]}

GABRUSENOKS, J ^{[1
]}

LUSIS, A ^{[1
]}

机构：

[1] UNIV LATVIA,INST SOLID STATE PHYS,RIGA 1063,LATVIA

来源：

APPLIED PHYSICS LETTERS | 1994年 / 65卷 / 16期

关键词：

D O I：

10.1063/1.112842

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Tungsten oxyfluoride films were prepared by reactive dc sputtering in plasmas containing O2 + CF4.. The deposition rate was large, particularly when chemical sputtering was promoted by heating the target. The films could show large charge insertion/extraction and high coloration efficiency. (C) 1994 American Institute of Physics.

引用

页码：1998 / 2000

页数：3

共 19 条

[1] AZENS A, 1992, P SOC PHOTO-OPT INS, V1728, P103, DOI 10.1117/12.130551
[2] AZENS A, IN PRESS P SPIE
[3] ELECTROCHROMIC COLOR-CENTERS IN AMORPHOUS TUNGSTEN TRIOXIDE THIN-FILMS
GABRUSENOKS, JV
CIKMACH, PD
LUSIS, AR
KLEPERIS, JJ
RAMANS, GM
[J]. SOLID STATE IONICS, 1984, 14 (01) : 25 - 30
[4] ELECTROCHROMIC OXIDES - A UNIFIED VIEW
GRANQVIST, CG
[J]. SOLID STATE IONICS, 1994, 70 : 678 - 685
[5] ELECTROCHROMIC OXIDES - A BAND-STRUCTURE APPROACH
GRANQVIST, CG
[J]. SOLAR ENERGY MATERIALS AND SOLAR CELLS, 1994, 32 (04) : 369 - 382
[6] GRANQVIST CG, 1993, PHYS THIN FILMS, V17, P301
[7] GRANQVIST CG, IN PRESS HDB SOLID S
[8] GRANQVIST CG, IN PRESS HDB INORGAN
[9] HIGH-RATE DC REACTIVELY SPUTTERED METAL-OXY-FLUORINE DIELECTRIC MATERIALS
HARDING, GL
[J]. THIN SOLID FILMS, 1986, 138 (02) : 279 - 287
[10] ANTIREFLECTION OF SPUTTERED HEAT MIRROR AND TRANSPARENT CONDUCTING COATINGS BY METAL-OXY-FLUORINE FILMS
HARDING, GL
HAMBERG, I
GRANQVIST, CG
[J]. SOLAR ENERGY MATERIALS, 1985, 12 (03): : 187 - 198

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