STUDY OF LANGMUIR-BLODGETT FILMS FOR KRF EXCIMER LASER RESIST

被引:8
作者
OGAWA, K [1 ]
TAMURA, H [1 ]
HATADA, M [1 ]
ISHIHARA, T [1 ]
机构
[1] JAPAN ATOM ENERGY RES INST,OSAKA LAB RADIAT,NEYAGAWA,OSAKA 572,JAPAN
关键词
D O I
10.1021/la00079a036
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
引用
收藏
页码:195 / 200
页数:6
相关论文
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