ELECTRICAL-PROPERTIES OF ELECTROLESS NI-P THIN-FILMS

被引：12

作者：

FERNANDEZ, M ^{[1
]}

MARTINEZDUART, JM ^{[1
]}

ALBELLA, JM ^{[1
]}

机构：

[1] UNIV AUTONOMA MADRID,DEPT FIS APLICADA,E-28049 MADRID,SPAIN

来源：

ELECTROCHIMICA ACTA | 1986年 / 31卷 / 01期

关键词：

ELECTROLESS PLATING - FILMS - Metallic - METALLIC COMPOUNDS - Electric Properties;

D O I：

10.1016/0013-4686(86)80060-3

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

The influence of the pH and temperature of the electroless solution on the electrical characteristics of the deposited Ni-P thin films has been determined. The phosphorous content of the films increases when the pH of the solution is decreased giving rise to a diminution of the temperature coefficient of the resistance (TCR). Low TCR films (TCR less than equivalent to 100 ppm degree C** minus **1) are obtained for pH equals 3. 4. In this pH range the deposition rate can be increased by heating the electroless solution to moderate temperatures.

引用

页码：55 / 57

页数：3

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