共 7 条
[1]
Boehm HP., 1966, ADV CATAL, V16, P179, DOI DOI 10.1016/S0360-0564(08)60354-5
[2]
ROOM-TEMPERATURE GLOW-DISCHARGE DEPOSITION OF SILICON-OXIDES FROM SIH4 AND N2O
[J].
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS,
1984, 2 (03)
:1233-1237
[3]
KAGANOWICZ G, 1983, JUL INT S PLASM CHEM, V6
[4]
KAGANOWICZ G, 1982, Patent No. 4355052
[5]
KIM G, 1983, COMMUNICATION
[6]
THOMAS JH, 1985, MATER RES SOC S P, V38, P293
[7]
VERMA S, 1983, COMMUNICATION