DEPOSITION OF TIB2 FILMS BY A CO-SPUTTERING METHOD

被引：46

作者：

SHIKAMA, T ^{[1
]}

SAKAI, Y ^{[1
]}

FUKUTOMI, M ^{[1
]}

OKADA, M ^{[1
]}

机构：

[1] NATL INST MET,TSUKUBA LAB,SAKURA,IBARAKI 305,JAPAN

来源：

THIN SOLID FILMS | 1988年 / 156卷 / 02期

关键词：

D O I：

10.1016/0040-6090(88)90323-9

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：287 / 293

页数：7

共 13 条

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[9] PROPERTIES AND STRUCTURE OF CARBON EXCESS TIXC1-X DEPOSITED ONTO MOLYBDENUM BY MAGNETRON SPUTTERING [J].

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[10] PROPERTIES OF TIC CO-DEPOSITED WITH AR GAS [J].

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