THICK BORIDE COATINGS BY CHEMICAL VAPOR-DEPOSITION

[1] [Anonymous], 1966, J ELECTROCHEM SOC

[2] Clark R. J. H., 1968, CHEM TITANIUM VANADI

[3] Goldschmidt H. J., 1967, INTERSTITIAL ALLOYS, DOI [10.1007/978-1-4899-5880-8, DOI 10.1007/978-1-4899-5880-8]

[4] Matkovich VI, 1977, BORON REFRACTORY BOR

[5] THE CHEMICAL VAPOR-DEPOSITION OF TIB2 FROM DIBORANE [J]. THIN SOLID FILMS, 1980, 72 (03) : 511 - 516

[6] THE CALCULATION AND USE OF CHEMICAL VAPOR-DEPOSITION PHASE-DIAGRAMS WITH APPLICATIONS TO THE TI-B-CL-H SYSTEM BETWEEN 1200 AND 800-K [J]. THIN SOLID FILMS, 1981, 75 (03) : 271 - 291

[1] [Anonymous], 1966, J ELECTROCHEM SOC

[2] Clark R. J. H., 1968, CHEM TITANIUM VANADI

[3] Goldschmidt H. J., 1967, INTERSTITIAL ALLOYS, DOI [10.1007/978-1-4899-5880-8, DOI 10.1007/978-1-4899-5880-8]

[4] Matkovich VI, 1977, BORON REFRACTORY BOR

[5] THE CHEMICAL VAPOR-DEPOSITION OF TIB2 FROM DIBORANE [J]. THIN SOLID FILMS, 1980, 72 (03) : 511 - 516

[6] THE CALCULATION AND USE OF CHEMICAL VAPOR-DEPOSITION PHASE-DIAGRAMS WITH APPLICATIONS TO THE TI-B-CL-H SYSTEM BETWEEN 1200 AND 800-K [J]. THIN SOLID FILMS, 1981, 75 (03) : 271 - 291