THE APPLICATION OF LIQUID-METAL ION SOURCES TO ION MICROPROBE SECONDARY ION MASS-SPECTROSCOPY

被引：17

作者：

BAYLY, AR

WAUGH, AR

VOHRALIK, P

机构：

来源：

关键词：

D O I：

10.1016/0584-8547(85)80121-X

中图分类号：

O433 [光谱学];

学科分类号：

0703 ; 070302 ;

摘要：

引用

页码：717 / 723

页数：7

共 9 条

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[2] BAYLY AR, 1983, SCANNING ELECTRON MI, V23
[3] CRIEGERN RV, 1983, FRESEN Z ANAL CHEM, V314, P293
[4] GNASER H, 1982, 29TH P INT FIELD ION, P399
[5] EVALUATION OF A CESIUM POSITIVE-ION SOURCE FOR SECONDARY ION MASS-SPECTROMETRY
STORMS, HA
BROWN, KF
STEIN, JD
[J]. ANALYTICAL CHEMISTRY, 1977, 49 (13) : 2023 - 2030
[6] EMISSION CHARACTERISTICS OF GALLIUM AND BISMUTH LIQUID-METAL FIELD-ION SOURCES
SWANSON, LW
SCHWIND, GA
BELL, AE
BRADY, JE
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1979, 16 (06): : 1864 - 1867
[7] THE APPLICATION OF LIQUID-METAL ION SOURCES TO SIMS
WAUGH, AR
BAYLY, AR
ANDERSON, K
[J]. VACUUM, 1984, 34 (1-2) : 103 - 106
[8] WAUGH AR, 1982, 29TH P INT FIELD EM, P409
[9] WAUGH AR, 1983, UNPUB 4TH P INT C SI