SIMS MICRO-ANALYSIS WITH A GALLIUM ION MICROPROBE

被引:29
作者
BAYLY, AR
WAUGH, AR
ANDERSON, K
机构
来源
NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH | 1983年 / 218卷 / 1-3期
关键词
D O I
10.1016/0167-5087(83)91009-8
中图分类号
TH7 [仪器、仪表];
学科分类号
0804 ; 080401 ; 081102 ;
摘要
引用
收藏
页码:375 / 382
页数:8
相关论文
共 12 条
  • [1] BAYLY AR, 1983, UNPUB P C SCANNING E
  • [2] ATOM-PROBE FIELD-ION MICROSCOPY OF A HIGH-INTENSITY GALLIUM ION-SOURCE
    CULBERTSON, RJ
    ROBERTSON, GH
    KUK, Y
    SAKURAI, T
    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1980, 17 (01): : 203 - 206
  • [3] GNASER H, 1982, 29TH P INT FIELD ION, P399
  • [4] LEVISETTI R, 1983, 29TH P FIELD ION EM, P417
  • [5] LIEBL H, NBS SPECIAL PUBLICAT, V427, P1
  • [6] DEPTH PROFILING BY SIMS DEPTH RESOLUTION, DYNAMIC-RANGE AND SENSITIVITY
    MAGEE, CW
    HONIG, RE
    [J]. SURFACE AND INTERFACE ANALYSIS, 1982, 4 (02) : 35 - 41
  • [7] MORRISON GH, 1975, ANAL CHEM, V47, pA922
  • [8] HIGH-RESOLUTION, ION-BEAM PROCESSES FOR MICROSTRUCTURE FABRICATION
    SELIGER, RL
    KUBENA, RL
    OLNEY, RD
    WARD, JW
    WANG, V
    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1979, 16 (06): : 1610 - 1612
  • [9] WAUGH AR, 1983, UNPUB P C LOW ENERGY
  • [10] WAUGH AR, 1982, 29TH P INT FIELD EM, P409