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SIMS MICRO-ANALYSIS WITH A GALLIUM ION MICROPROBE
被引:29
作者
:
BAYLY, AR
论文数:
0
引用数:
0
h-index:
0
BAYLY, AR
WAUGH, AR
论文数:
0
引用数:
0
h-index:
0
WAUGH, AR
ANDERSON, K
论文数:
0
引用数:
0
h-index:
0
ANDERSON, K
机构
:
来源
:
NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH
|
1983年
/ 218卷
/ 1-3期
关键词
:
D O I
:
10.1016/0167-5087(83)91009-8
中图分类号
:
TH7 [仪器、仪表];
学科分类号
:
0804 ;
080401 ;
081102 ;
摘要
:
引用
收藏
页码:375 / 382
页数:8
相关论文
共 12 条
[11]
Werner H. W., 1980, Surface and Interface Analysis, V2, P56, DOI 10.1002/sia.740020205
[12]
DYNAMIC-RANGE OF 106 IN DEPTH PROFILING USING SECONDARY-ION MASS-SPECTROMETRY
WITTMAACK, K
论文数:
0
引用数:
0
h-index:
0
机构:
PHILIPS RES LABS, REDHILL RH1 5HA, SURREY, ENGLAND
PHILIPS RES LABS, REDHILL RH1 5HA, SURREY, ENGLAND
WITTMAACK, K
CLEGG, JB
论文数:
0
引用数:
0
h-index:
0
机构:
PHILIPS RES LABS, REDHILL RH1 5HA, SURREY, ENGLAND
PHILIPS RES LABS, REDHILL RH1 5HA, SURREY, ENGLAND
CLEGG, JB
[J].
APPLIED PHYSICS LETTERS,
1980,
37
(03)
: 285
-
287
←
1
2
→
共 12 条
[11]
Werner H. W., 1980, Surface and Interface Analysis, V2, P56, DOI 10.1002/sia.740020205
[12]
DYNAMIC-RANGE OF 106 IN DEPTH PROFILING USING SECONDARY-ION MASS-SPECTROMETRY
WITTMAACK, K
论文数:
0
引用数:
0
h-index:
0
机构:
PHILIPS RES LABS, REDHILL RH1 5HA, SURREY, ENGLAND
PHILIPS RES LABS, REDHILL RH1 5HA, SURREY, ENGLAND
WITTMAACK, K
CLEGG, JB
论文数:
0
引用数:
0
h-index:
0
机构:
PHILIPS RES LABS, REDHILL RH1 5HA, SURREY, ENGLAND
PHILIPS RES LABS, REDHILL RH1 5HA, SURREY, ENGLAND
CLEGG, JB
[J].
APPLIED PHYSICS LETTERS,
1980,
37
(03)
: 285
-
287
←
1
2
→