DYNAMIC-RANGE OF 106 IN DEPTH PROFILING USING SECONDARY-ION MASS-SPECTROMETRY

被引：61

作者：

WITTMAACK, K ^{[1
]}

CLEGG, JB ^{[1
]}

机构：

[1] PHILIPS RES LABS, REDHILL RH1 5HA, SURREY, ENGLAND

来源：

APPLIED PHYSICS LETTERS | 1980年 / 37卷 / 03期

关键词：

D O I：

10.1063/1.91908

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：285 / 287

页数：3

共 17 条

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[7]

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[8] PROBLEMS IN ELEMENTAL CONCENTRATION DEPTH PROFILING WITH AN ION MICROPROBE [J].

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[9]

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[10] DEPTH PROFILE DETECTION LIMIT OF 3X10(15) ATOM CM-3 FOR AS IN SI USING CS+ BOMBARDMENT NEGATIVE SECONDARY ION MASS-SPECTROMETRY [J].

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APPLIED PHYSICS LETTERS, 1977, 30 (11) :559-561

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