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INFLUENCE OF SPHERICAL INDENTOR RADIUS ON THE INDENTATION-INDUCED TRANSFORMATION BEHAVIOR OF SILICON
被引:48
作者:
WEPPELMANN, ER
FIELD, JS
SWAIN, MV
机构:
[1] CSIRO,DIV APPL PHYS,SYDNEY,NSW 2070,AUSTRALIA
[2] UNIV SYDNEY,DEPT MECH & MECHATRON ENGN,SYDNEY,NSW 2006,AUSTRALIA
关键词:
D O I:
10.1007/BF01184600
中图分类号:
T [工业技术];
学科分类号:
08 ;
摘要:
The force-displacement records of the indentation of silicon single crystals have been monitored with an ultra-micro indentation system using spherical-tipped diamond indenters. The observations with indenters of different radii varying from nominally 5-20 mu m all exhibited similar behaviour. At low loads, the behaviour was entirely elastic and exhibited complete reversibility. At slightly heavier loads the onset of non-linear behaviour occurred, which, in many cases, appeared to be completely reversible. In all the other cases at this and higher load levels, a ''pop-out'' event occurred during the unloading in what otherwise appeared to be an elastic unloading. The results are interpreted in terms of the indentation pressure-induced phase transformation from silicon-I to silicon-II on loading and to silicon-III upon unloading.
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页码:2455 / 2462
页数:8
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