CHEMICAL ETCHING OF P-TYPE SI(100) BY K2CR2O7 - A COMBINED INVESTIGATION BY TRMC AND XPS, UPS, AND LEED

被引：11

作者：

KUNST, M

JAEGERMANN, W

SCHMEISSER, D

机构：

来源：

APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING | 1987年 / 42卷 / 01期

关键词：

D O I：

10.1007/BF00618159

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：57 / 64

页数：8

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KUNST, M ;

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[8]

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[9]

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[10]

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