GROWTH OF SRTIO3 THIN EPITAXIAL-FILMS BY AEROSOL MOCVD

被引：20

作者：

FROHLICH, K ^{[1
]}

MACHAJDIK, D ^{[1
]}

ROSOVA, A ^{[1
]}

VAVRA, I ^{[1
]}

WEISS, F ^{[1
]}

BOCHU, B ^{[1
]}

SENATEUR, JP ^{[1
]}

机构：

[1] ECOLE NATL SUPER PHYS GRENOBLE,MAT & GENIE PHYS LAB,CNRS,URA 1190,F-38402 ST MARTIN DHERES,FRANCE

来源：

THIN SOLID FILMS | 1995年 / 260卷 / 02期

关键词：

EPITAXY; ORGANOMETALLIC VAPOR DEPOSITION; TRANSMISSION ELECTRON MICROSCOPY; X-RAY DIFFRACTION;

D O I：

10.1016/0040-6090(94)06507-1

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

SrTiO3 thin films were prepared by aerosol metal-organic chemical vapour deposition on (001) MgO, R-plane Al2O3 and (001) Si single-crystal substrates. Strontium tetramethyl heptadionate and titanium n-butoxide dissolved in diethyleneglycol dimethyl ether were used as precursors. The structure of the films was investigated by X-ray diffraction and transmission electron microscopy. Epitaxial films with [001] and [111] orientation perpendicular to the substrate surface were obtained on MgO and Al2O3, respectively. The epitaxial films on the MgO substrate were found to be in a relaxed state with lattice parameters corresponding to the bulk values. SrTiO3 films on the Si substrate were grown as highly textured in the [011] direction and randomly oriented in the plane parrallel to the substrate surface.

引用

页码：187 / 191

页数：5

共 8 条

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[Anonymous], POWDER DIFFRACTION F

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