COLORING OF IRON SURFACE CONTROLLED BY TI+-O+ DOUBLE-ION IMPLANTATIONS

被引：10

作者：

OKABE, Y ^{[1
]}

IWAKI, M ^{[1
]}

TAKAHASHI, K ^{[1
]}

NAMBA, S ^{[1
]}

YOSHIDA, K ^{[1
]}

机构：

[1] INST PHYS & CHEM RES,WAKO,SAITAMA 351,JAPAN

来源：

关键词：

D O I：

10.1016/0168-583X(85)90552-X

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

引用

页码：184 / 187

页数：4

共 8 条

[1] ASHWORTH V, 1980, ION IMPLANTATION TRE, P175
[2] CLAYTON CR, 1981, NUCL INSTRUM METHODS, V182, P875
[3] HARTLEY NEW, 1980, TREATISE MATERIALS S, V18, P321
[4] LINDHARD J, 1963, DAN VID SELSK MAT FY, V33
[5] ANODIC-DISSOLUTION BEHAVIOR OF SI-IMPLANTED AND TI-IMPLANTED IRON
OKABE, Y
IWAKI, M
TAKAHASHI, K
YOSHIDA, K
[J]. JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, 1983, 22 (03): : L165 - L167
[6] OKABE Y, 1983, 7TH P S ION SOURC IO, P1811
[7] OKITAKA K, 1984, 15TH P S ION IMPL SU, P57
[8] ABSORPTION OF CARBON FROM RESIDUAL GASES DURING TI IMPLANTATION OF ALLOYS
SINGER, IL
BARLAK, TM
[J]. APPLIED PHYSICS LETTERS, 1983, 43 (05) : 457 - 459