CHEMICALLY VAPOR-DEPOSITED TUNGSTEN, GRAIN-REFINED AND STABILIZED

被引：7

作者：

BRYANT, WA ^{[1
]}

机构：

[1] WESTINGHOUSE ELECT CORP,ASTRONUCL LAB,POB 10864,PITTSBURGH,PA 15236

来源：

JOURNAL OF THE LESS-COMMON METALS | 1976年 / 45卷 / 01期

关键词：

D O I：

10.1016/0022-5088(76)90194-6

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

引用

页码：37 / 44

页数：8

共 16 条

[1] HIGH-TEMPERATURE STRENGTH STABILITY OF 3 FORMS OF CHEMICALLY VAPOR-DEPOSITED TUNGSTEN
BRYANT, WA
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1974, 11 (04): : 695 - 699
[2] DANKO JC, 1970, CHEMICAL VAPOR DEPOS, P227
[3] FARRELL K, 1970, CHEMICAL VAPOR DEPOS, P263
[4] FARRELL K, 1967, P C CHEM VAPOR DEPOS, P363
[5] Festa J., 1967, P C CVD GATLINBURG, P349
[6] HOERTEL FW, 6731 US BUR MIN REP
[7] HOLMAN WR, 1967, P C CHEM VAP DEP REF, P427
[8] HOLMAN WR, 1967, P C CHEM VAPOR DEPOS, P127
[9] ULTRAFINE DISPERSION-STRENGTHENING OF TUNGSTEN BY CHEMICAL COVAPOR DEPOSITION
LANDINGHAM, RL
CASEY, AW
[J]. JOURNAL OF THE LESS-COMMON METALS, 1972, 26 (02): : 173 - +
[10] FINE-GRAIN TUNGSTEN BY CHEMICAL VAPOR DEPOSITION
LANDINGHAM, RL
AUSTIN, JH
[J]. JOURNAL OF THE LESS-COMMON METALS, 1969, 18 (03): : 229 - +