STRESS IN EVAPORATED BISMUTH FILMS DURING AND AFTER DEPOSITION

[1] CALCULATION OF STRESS IN ELECTRODEPOSITS FROM THE CURVATURE OF A PLATED STRIP [J]. JOURNAL OF RESEARCH OF THE NATIONAL BUREAU OF STANDARDS, 1949, 42 (02): : 105 - 123

[2] CAMPBELL DS, 1966, 1965 P INT S GOTT, V9, P223

[3] CASWELL HL, 1968, J APPL PHYS, V34, P3261

[4] EHRLICH G, 1959, STRUCTURE PROPERTIES, P426

[5] FAMNIK YF, 1963, SOVIET PHYSICSSOLID, V5, P721

[6] GUNTHER G, 1966, 1965 P INT S GOTT, V9, P223

[7] DIELECTRIC THIN FILMS [J]. JOURNAL OF THE OPTICAL SOCIETY OF AMERICA, 1957, 47 (06) : 469 - 472

[8] HOLLAND L, 1958, VACUUM DEPOSITION TH

[9] HORIKOSHI H, 1962, JPN J APPL PHYS, V1, P304

[10] STRESS IN VACUUM DEPOSITED FILMS OF SILVER [J]. JAPANESE JOURNAL OF APPLIED PHYSICS, 1967, 6 (01) : 42 - +

[1] CALCULATION OF STRESS IN ELECTRODEPOSITS FROM THE CURVATURE OF A PLATED STRIP [J]. JOURNAL OF RESEARCH OF THE NATIONAL BUREAU OF STANDARDS, 1949, 42 (02): : 105 - 123

[2] CAMPBELL DS, 1966, 1965 P INT S GOTT, V9, P223

[3] CASWELL HL, 1968, J APPL PHYS, V34, P3261

[4] EHRLICH G, 1959, STRUCTURE PROPERTIES, P426

[5] FAMNIK YF, 1963, SOVIET PHYSICSSOLID, V5, P721

[6] GUNTHER G, 1966, 1965 P INT S GOTT, V9, P223

[7] DIELECTRIC THIN FILMS [J]. JOURNAL OF THE OPTICAL SOCIETY OF AMERICA, 1957, 47 (06) : 469 - 472

[8] HOLLAND L, 1958, VACUUM DEPOSITION TH

[9] HORIKOSHI H, 1962, JPN J APPL PHYS, V1, P304

[10] STRESS IN VACUUM DEPOSITED FILMS OF SILVER [J]. JAPANESE JOURNAL OF APPLIED PHYSICS, 1967, 6 (01) : 42 - +