A STUDY OF THE MICROSTRUCTURE OF A-SI-H USING SPECTROSCOPIC ELLIPSOMETRY MEASUREMENTS

被引：23

作者：

COLLINS, RW

BITER, WJ

CLARK, AH

WINDISCHMANN, H

机构：

来源：

THIN SOLID FILMS | 1985年 / 129卷 / 1-2期

关键词：

D O I：

10.1016/0040-6090(85)90101-4

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：127 / 138

页数：12

共 27 条

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[7]

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[8] OPTICAL-PROPERTIES OF LOW-PRESSURE CHEMICALLY VAPOR-DEPOSITED SILICON OVER THE ENERGY-RANGE 3.0-EV-6.0-EV [J].

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[10]

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