CHEMICAL SPUTTERING BY KEV IONS

被引：23

作者：

HARING, RA ^{[1
]}

KOLFSCHOTEN, AW ^{[1
]}

DEVRIES, AE ^{[1
]}

机构：

[1] PHILIPS RES LABS, 5600 JA EINDHOVEN, NETHERLANDS

来源：

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS | 1984年 / 2卷 / 1-3期

关键词：

D O I：

10.1016/0168-583X(84)90263-5

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

引用

收藏

页码：544 / 549

页数：6

相关论文

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