INP/INGAAS DOUBLE HETEROJUNCTION BIPOLAR-TRANSISTORS GROWN BY METALORGANIC VAPOR-PHASE EPITAXY WITH SULFUR-DELTA DOPING IN THE COLLECTOR REGION

被引:23
作者
TOKUMITSU, E [1 ]
DENTAI, AG [1 ]
JOYNER, CH [1 ]
CHANDRASEKHAR, S [1 ]
机构
[1] AT&T BELL LABS,CRAWFORD HILL LAB,HOLMDEL,NJ 07733
关键词
D O I
10.1063/1.104107
中图分类号
O59 [应用物理学];
学科分类号
摘要
Sulfur-delta-coping in InP by metalorganic vapor phase epitaxy is reported. A peak carrier concentration of 7 x 10(17) cm-3 with a full width at half maximum of 30 nm has been measured by the electrochemical capacitance-voltage technique. It is shown that by inserting the delta-doping spike in the collector region of InP/InGaAs double heterojunction transistors, the effective barrier height at the base-collector interface can be reduced without increasing the base-collector capacitance and excellent transistor characteristics can be realized.
引用
收藏
页码:2841 / 2843
页数:3
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