TECHNIQUES FOR USING EMITTING PROBES FOR POTENTIAL MEASUREMENT IN RF PLASMAS

[1] BREUN R, COMMUNICATION

[2] Chapman B, 1980, GLOW DISCHARGES PROC

[3] DOUBLE-PROBE METHOD FOR UNSTABLE PLASMAS [J]. REVIEW OF SCIENTIFIC INSTRUMENTS, 1964, 35 (09) : 1208 - &

[4] CHEN FF, 1985, IPPJ750 NAG U I PLAS

[5] MEASUREMENT OF VACUUM SPACE POTENTIAL BY AN EMISSIVE PROBE [J]. REVIEW OF SCIENTIFIC INSTRUMENTS, 1984, 55 (04) : 631 - 632

[6] A SYSTEM FOR DETERMINING MASS ENERGY OF PARTICLES INCIDENT ON A SUBSTRATE IN A PLANAR DIODE SPUTTERING SYSTEM [J]. REVIEW OF SCIENTIFIC INSTRUMENTS, 1970, 41 (08) : 1219 - &

[7] FOREST C, 1985, PTMR8512 U WISC MAD

[8] AN INFLUENCE OF A HEATING VOLTAGE ON AN EMISSIVE PROBE CHARACTERISTIC IN A PLASMA [J]. JOURNAL OF THE PHYSICAL SOCIETY OF JAPAN, 1981, 50 (11) : 3759 - 3761

[9] GULIDOV SS, 1970, SOV PHYS TECH PHYS-U, V14, P993

[10] WEAK DOUBLE-LAYERS [J]. PLASMA PHYSICS AND CONTROLLED FUSION, 1981, 23 (10) : 903 - 925

[1] BREUN R, COMMUNICATION

[2] Chapman B, 1980, GLOW DISCHARGES PROC

[3] DOUBLE-PROBE METHOD FOR UNSTABLE PLASMAS [J]. REVIEW OF SCIENTIFIC INSTRUMENTS, 1964, 35 (09) : 1208 - &

[4] CHEN FF, 1985, IPPJ750 NAG U I PLAS

[5] MEASUREMENT OF VACUUM SPACE POTENTIAL BY AN EMISSIVE PROBE [J]. REVIEW OF SCIENTIFIC INSTRUMENTS, 1984, 55 (04) : 631 - 632

[6] A SYSTEM FOR DETERMINING MASS ENERGY OF PARTICLES INCIDENT ON A SUBSTRATE IN A PLANAR DIODE SPUTTERING SYSTEM [J]. REVIEW OF SCIENTIFIC INSTRUMENTS, 1970, 41 (08) : 1219 - &

[7] FOREST C, 1985, PTMR8512 U WISC MAD

[8] AN INFLUENCE OF A HEATING VOLTAGE ON AN EMISSIVE PROBE CHARACTERISTIC IN A PLASMA [J]. JOURNAL OF THE PHYSICAL SOCIETY OF JAPAN, 1981, 50 (11) : 3759 - 3761

[9] GULIDOV SS, 1970, SOV PHYS TECH PHYS-U, V14, P993

[10] WEAK DOUBLE-LAYERS [J]. PLASMA PHYSICS AND CONTROLLED FUSION, 1981, 23 (10) : 903 - 925