DEVICE QUALITY AIGAAS/GAAS HETEROSTRUCTURES GROWN IN A MULTICHAMBER ORGANOMETALLIC VAPOR-PHASE EPITAXIAL APPARATUS

被引:13
作者
SHEALY, JR [1 ]
机构
[1] CORNELL UNIV,SCH ELECT ENGN,ITHACA,NY 14853
关键词
D O I
10.1063/1.96660
中图分类号
O59 [应用物理学];
学科分类号
摘要
引用
收藏
页码:925 / 927
页数:3
相关论文
共 9 条
[1]   ATOMIC LAYER EPITAXY OF III-V BINARY COMPOUNDS [J].
BEDAIR, SM ;
TISCHLER, MA ;
KATSUYAMA, T ;
ELMASRY, NA .
APPLIED PHYSICS LETTERS, 1985, 47 (01) :51-53
[2]  
DAPKUS PD, 1981, J CRYST GROWTH, V55, P255
[3]   EFFECT OF BARRIER THICKNESS ON THE LUMINESCENCE PROPERTIES OF ALAS/GAAS MULTIPLE QUANTUM WELLS GROWN BY MOLECULAR-BEAM EPITAXY [J].
DEMIGUEL, JL ;
FUJIWARA, K ;
TAPFER, L ;
PLOOG, K .
APPLIED PHYSICS LETTERS, 1985, 47 (08) :836-838
[4]   NEW APPROACH TO GROWTH OF ABRUPT HETEROJUNCTIONS BY MOVPE [J].
MOSS, RH ;
SPURDENS, PC .
ELECTRONICS LETTERS, 1984, 20 (23) :978-980
[5]   THE GROWTH AND CHARACTERIZATION OF HIGH-QUALITY MOVPE GAAS AND GAALAS [J].
NAKANISI, T .
JOURNAL OF CRYSTAL GROWTH, 1984, 68 (01) :282-294
[6]  
SHEALY JR, 1982, I PHYSICS C SERIES, V65, P109
[7]  
SHEALY JR, UNPUB
[8]  
TOKUDA Y, 1985, 12TH INT S GAAS JAR
[9]  
Tsu R., 1981, SOC PHOTOOPT INSTRUM, V276, P78